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According to a new market report published by Lucintel, the future of the extreme ultraviolet lithography (EUVL) market looks promising with opportunities in the integrated device manufacturer and foundry end use industries. The global extreme ultraviolet lithography market is expected to grow with a CAGR of 14% from 2021 to 2026. The major drivers for this market are increasing demand for advanced packaging for small devices and growth in wafer processing.

To download report brochure, please go to https://www.lucintel.com/extreme-ultraviolet-lithography-market.aspx and click "download brochure" tab from the menu.



In this market, Laser Produced Plasmas (LPP), vacuum sparks, and gas discharges are the major light sources. Laser Produced Plasmas (LPP) will remain the largest light source segment over the forecast period, as it is used to produce high power EUV radiation.

Within the extreme ultraviolet lithography market, foundry will remain the largest end use industry during the forecast period due to a high number of wafer processing at foundries.

Asia Pacific will remain the largest region during the forecast period due to an increasing number of wafer processing capabilities in this region and demand for miniaturized devices.  

ASML, Canon Inc., Intel Corporation, Nikon Corporation, NuFlare Technology Inc., Samsung Corporation, SUSS Microtec AG, Taiwan Semiconductor Manufacturing Company Limited (TSMC), Ultratech Inc., and Vistec Semiconductor Systems are among the major extreme ultraviolet lithography manufacturers.

Lucintel, a leading global strategic consulting and market research firm, has analyzed growth opportunities in the global extreme ultraviolet lithography market by light source, equipment, end use industry, and region. Lucintel has prepared a comprehensive research report titled “Growth Opportunities in the Global Extreme Ultraviolet Lithography Market 2021-2026: Trends, Forecast, and Opportunity Analysis.” This Lucintel report serves as a catalyst for growth strategy, as it provides comprehensive data and analysis on trends, key drivers, and directions. The study includes trends and forecast for the global extreme ultraviolet lithography market by light source, equipment, end use industry, and region as follows:

By Light Source [$M shipment analysis for 2015 – 2026]:



  • Laser Produced Plasmas (LPP)


  • Vacuum Sparks


  • Gas Discharges


By Equipment [$M shipment analysis for 2015 – 2026]:



  • Light Source


  • Mirrors


  • Masks


  • Others


 By End Use Industry [$M shipment analysis for 2015 – 2026]:



  • Integrated Device Manufacturers (IDM)


  • Foundry


 By Region [$M shipment analysis for 2015 – 2026]:



  • North America


    • United States


    • Canada


    • Mexico




  • Europe


    • Germany


    • United Kingdom


    • France


    • Italy




  • Asia Pacific


    • China


    • Japan


    • India


    • South Korea




  • The Rest of the World


This more than 150 page research report will enable you to make confident business decisions in this globally competitive marketplace. For a detailed table of contents, contact Lucintel at +1-972-636-5056 or visit us at helpdesk@lucintel.com.

About Lucintel

Lucintel, the premier global Management Consulting and market research firm, creates winning strategies for growth. We offer market assessments, competitive analysis, opportunity analysis, Growth Consulting, M&A, and Due diligence services to executives and key decision makers in a variety of industries. For further information, visit www.lucintel.com.