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According to a new market report published by Lucintel, the future of the EUV lithography market looks promising with opportunities in the integrated device manufacturers (IDM) and foundry industries. The global EUV lithography market is expected to grow with a CAGR of 28% from 2021 to 2026. The major drivers for this market are rising demand for miniaturization of chip size and increasing demand of EUV lithography manufacturing and production.

To download report brochure, please go to https://www.lucintel.com/euv-lithography-market.aspx and click "download brochure" tab from the menu.



In this market, different light source of EUV lithography, such as laser produced plasma (LPP), vacuum sparks, and gas discharges are used in a wide range of industries. Lucintel forecasts that laser produced plasma (LPP) will remain the largest segment due to growth in the IDM end use industry.

Within the EUV lithography market, IDM will remain the largest end use industry during the forecast period due to rising demand in various consumer applications, majorly in smartphones.

Asia Pacific will remain the largest region during the forecast period due to increasing demand from Fab-less players at leading foundries and growing number of wafer processing capability in APAC region.

ASML Holding, Nikon Corporation, Canon Inc., Carl Zeiss, Toppan Printing, NTT Advanced Technology, Intel, Samsung, SK Hynix, Toshiba, TSMC, and GLOBALFOUNDRIES are among the major EUV lithography manufacturers.

Lucintel, a leading global strategic consulting and market research firm, has analyzed growth opportunities in the global EUV lithography market by light source, equipment, end use industry, and region. Lucintel has prepared a comprehensive research report titled “Growth Opportunities in the Global EUV Lithography Market 2021-2026: Trends, Forecast, and Opportunity Analysis.” This Lucintel report serves as a catalyst for growth strategy, as it provides comprehensive data and analysis on trends, key drivers, and directions. The study includes trends and forecast for the global EUV lithography market by light source, equipment, end use industry, and region as follows:

By Light Source [$M shipment analysis for 2015 – 2026]:



  • Laser Produced Plasmas (LPP)


  • Vacuum Sparks


  • Gas Discharges


By Equipment [$M shipment analysis for 2015 – 2026]:



  • Light Source


  • Mirrors


  • Mask


  • Others


 By End Use Industry [$M shipment analysis for 2015 – 2026]:



  • Integrated device manufacturers (IDM)


  • Foundry


 By Region [$M shipment analysis for 2015 – 2026]:



  • North America


    • United States


    • Canada


    • Mexico




  • Europe


    • Germany


    • United Kingdom


    • France


    • Italy




  • Asia Pacific


    • China


    • Japan


    • India


    • South Korea




  • The Rest of the World


 

This more than 150-page research report will enable you to make confident business decisions in this globally competitive marketplace. For a detailed table of contents, contact Lucintel at +1-972-636-5056 or visit us at helpdesk@lucintel.com.

About Lucintel

Lucintel, the premier global Management Consulting and market research firm, creates winning strategies for growth. We offer market assessments, competitive analysis, opportunity analysis, Growth Consulting, M&A, and Due diligence services to executives and key decision makers in a variety of industries. For further information, visit www.lucintel.com.